Ceramic beams and thin film growth

Abstract

Alumina is dissolved in supercritical water, expanded in a supersonic free jet, and collected on a variety of substrates to grow thin ceramic films at deposition rates of 10 -5 gm h -1. Electron spectroscopy for chemical analysis and Fourier transform IR analyses of these films are reported. A gas dynamics model which compares the use of a capillary nozzle with a simple sharp-edged perture nozzle is also presented. Calculations are shown which indicate that the choice of nozzle geometru may make little difference in the film growth if the flow rates are the same.