磁控濺鍍製作CeO2-Al2O3/Ag/CeO2-Al2O3多層膜於低輻射玻璃之研究

Abstract

Since the end of the seventies vacuum coating technology for the deposition of optical thin film on glass substrates has enjoyed a steady growth, the design of structure of Low emissivity coating and research on characteristic of Low-E coating became an issue, recently. Glasses deposited with Low-E films can reflect infrared and ultraviolet while having high transmittance of visible light. This thesis grows up Low-E films by reactive magnetron sputtering, that mainly research material used CeO2-Al2O3 to be dielectric layer of Ag based Low-E film. The main content of this thesis is as follows: make an introduction to Low-E glass preparation method, energy saving characteristic, principle and categories. To probe dielectric layer and function layer of optical characteristic, the hot reflecting rate of radiation, electricity characteristic under different film thickness. Film optical characteristic, radiation hot reflecting rate, electricity characteristic, crystallization after heat treatment processing, and acid and alkali test with the film. According the result of experiment, shows that the visible transmittance of the films increased with the dielectric layer of CeO2-Al2O3 film thickness rising, the highest peak of the transmittance rate is increasing with the film thickness to the long wavelength direction decreasing and shift. So CeO2-Al2O3 possesses the performance of dielectric layer of Low-E film. When dielectric layer CeO2-Al2O3 and function layer Ag film thickness are the same 20nm, the highest visible transmittance is 79% while the average value around 61%, infrared transmittance average around 26%. Its performance reaches the Sunlight Controls Low-E film standard. When dielectric layer CeO2-Al2O3 film thickness is 20nm, function layer Ag film thickness is 10nm, the highest visible transmittance is 84% while the average value around 79%, infrared transmittance average around 56%. Its performance can reach single silver Low-E film standard.