Centrosymmetric TiS as a novel topological electronic material with coexisting type-I, type-II and hybrid nodal line states

Long Xu, Xuefang Dai + Show 6 more

https://doi.org/10.1039/d0tc03600e

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Journal: Journal of Materials Chemistry C	Publication Date: Jan 1, 2020
Citations: 10

Abstract

TiS is a novel topological material with coexisting type-I, type-II and hybrid nodal lines in the native state.

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