Abstract
Thin layers of iron silicides produced by ion implantation were investigated by 57 Fe conversion electron Miissbauer spectroscopy and Auger electron spectroscopy. The Mossbauer hyperfine parameters were calculated and compared with results obtained at crystalline layers to determine the phases formed. It was found that, depending on the implantation conditions, the phases α- and β-FeSi 2 , e-FeSi or mixtures of them are formed. Auger electron spectroscopy was used to analyse the depth distribution of the elements in the layer. The iron concentrations necessary, according to the equilibrium phase diagram, to form the compounds mentioned above were not reached as a result of the implantation. Therefore, the formation of precipitates is concluded. Furthermore, it was found that the Si KLL Auger peak is very sensitive to silicide bonding. Its energy shift can be used as an indicator for silicide formation.
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