Abstract
BN films were deposited by hot filament-assisted microwave electron cyclotron resonance (ECR) chemical vapor deposition (CVD) technique. It was found that hot filament in the general ECR CVD system is helpful to the formation of cubic BN phase (cBN). Although a negative bias to the substrate is probably a key to cBN formation, hot filament may be a way to enhance the activation of the precursors and be beneficial to the deposition of cBN at a proper bias and substrate temperature of 400°C, while at the same condition no cBN was observed in the films when deposited without hot filament.
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