Abstract
Download options Please wait... Article information DOI https://doi.org/10.1039/C1PY00460C Article type Paper Submitted 04 Oct 2011 Accepted 18 Nov 2011 First published 13 Dec 2011 Download Citation Polym. Chem., 2012,3, 1899-1902 BibTex EndNote MEDLINE ProCite ReferenceManager RefWorks RIS Permissions Request permissions Cationic photosensitive formulations based on silyl radical chemistry for green and red diode laser exposure M. Tehfe, D. Gigmes, F. Dumur, D. Bertin, F. Morlet-Savary, B. Graff, J. Lalevée and J. Fouassier, Polym. Chem., 2012, 3, 1899 DOI: 10.1039/C1PY00460C To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page. If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given. If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page. Read more about how to correctly acknowledge RSC content. Social activity Tweet Share Search articles by author Mohamad-Ali Tehfe Didier Gigmes Frédéric Dumur Denis Bertin Fabrice Morlet-Savary Bernadette Graff Jacques Lalevée Jean-Pierre Fouassier
Sign-in/Register to access full text options 
Free) 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call
