Abstract
The diffusion of $^{63}\mathrm{Ni}$ has been measured in ${\mathrm{YBa}}_{2}$${\mathrm{Cu}}_{3}$${\mathrm{O}}_{7\mathrm{\ensuremath{-}}\mathrm{\ensuremath{\delta}}}$ epitaxial thin films on (100) ${\mathrm{SrTiO}}_{3}$ substrates in the 550--650 \ifmmode^\circ\else\textdegree\fi{}C range (orthorhombic phase) in ${\mathrm{O}}_{2}$ pressure of 1 bar, keeping \ensuremath{\delta} in the 0.3--0.4 range. The diffusion behavior is described by D=1.3 exp[(-2.7 eV)/kT] ${\mathrm{cm}}^{2}$/sec and is many orders of magnitude slower than anion (oxygen) diffusion reported in the literature. A diffusion mechanism involving thermal vacancies and atomic jumps in diagonal directions of the type 〈110〉, 〈301〉, and 〈031〉 is proposed for long-range diffusion of cations occupying the Cu sites.
Published Version
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