Cathodic arc sources and macroparticle filtering

Abstract

Cathodic arc sources of metallic plasma are used widely in surface modification technologies: deposition of the different functional coatings, ion implantation and combinations of these processes. Possibilities for the extraction of the high ionized plasma flow and high ion current of practically all electroconducting materials as well as the design simplicity and the reliability of this technique allow the use of the cathodic arc sources (with macroparticle filtering or without it) in machine-building, electronic, automobile, aircraft and other branches of industry. A review report on more than 25 years of the development history of cathodic arc sources and macroparticle filtering (for separation of the plasma flow from the neutral atoms and macroparticles) is presented. Arc sources with the plane and the cylindrical evaporation surfaces, with the magnetic control and without it are considered. Different designs of the cathodic arc sources as well as their advantages and disadvantages are analyzed. The most effective and simple technique for separation and focusing of plasma flow are the devices where the control of plasma flow (created by arc sources) is carried out by means of plasma optical methods. Using plasma optical principles it is possible to control the electric field structure and plasma motion changing magnetic field configuration. The different designs of the magnetic separators, the focusing and the scanning systems are considered. The advantages and disadvantages of these plasma optical systems and their possibilities are described.