Abstract

Plasmonic catalysis triggers the dissociation of H2 or adsorbed O2 (sluggish processes) under continuous wave excitation via plasmon decay. This is coupled to interband or intraband excitation of d-band or sp-band, respectively, to levels above fermi level of metals. Here, we have studied the plasmonic and photocatalytic behavior in an environment friendly medium with AM 1.5 G sunlight of CuO/Cu2O thin films fabricated by pulsed laser deposition technique in vacuum with varying thickness. We have achieved ∼0.59 kmol h−1g−1H2 production in the CuO/Cu2O film with a thickness of ∼27 nm. The role of plasmons with metal–dielectric and semiconductor–semiconductor interfaces is conducted through both experimental and theoretical approaches. The results suggest that the impact of plasmonic catalysis/synthesis is subject to the dimension, composition, and band alignment of two interface materials.

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