Abstract
To improve the properties of NiSi film (that is, thermal stability and morphological stability), Pt is added into the Ni-Si system. With the purposed growth of an oxide interlayer between Ni and Si, a previously unnoticeable catalysis effect of Pt was found, by which Ni can react with the oxide interlayer during 550-600°C anneal, thereafter facilitating Ni to diffuse into Si substrate and form NiSi phase.
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