Abstract
We investigated to find the optimal sputtering conditions for the forming of a titanium oxide (TiO 2) film as short-circuit preventive layer (blocking layer) between conductive transparent electrode and porous TiO 2 film in the dye-sensitized solar cell (DSC). The conversion efficiency ( η) was improved so that the electrode substrate temperature and Ar gas pressure during sputtering were high. From the results of X-ray diffraction and Raman inspections, it indicates that sputtered TiO 2 blocking layer should be rutile crystalline for higher performance of DSC.
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