Abstract

We report the modification of electrical properties of chemical-bath-deposited antimony sulphide (Sb 2S 3) thin films by thermal diffusion of carbon. Sb 2S 3 thin films were obtained from a chemical bath containing SbCl 3 and Na 2S 2O 3 salts at room temperature (27 °C) on glass substrates. A carbon thin film was deposited on Sb 2S 3 film by arc vacuum evaporation and the Sb 2S 3–C layer was subjected to heating at 300 °C in nitrogen atmosphere or in low vacuum for 30 min. The value of resistivity of Sb 2S 3 thin films was substantially reduced from 10 8 Ω cm for undoped condition to 10 2 Ω cm for doped thin films. The doped films, Sb 2S 3:C, retained the orthogonal stibnite structure and the optical band gap energy in comparison with that of undoped Sb 2S 3 thin films. By varying the carbon content (wt%) the electrical resistivity of Sb 2S 3 can be controlled in order to make it suitable for various opto-electronic applications.

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