Abstract

We have developed carbon nanotube (CNT) vias consisting of about 1000 tubes. The total resistance of the CNT via was measured as three orders of magnitude lower than the current flows in parallel through about 1000 tubes. There is no degradation observed for 100 hours at the via current density of 2/spl times/10/sup 6/ A/cm/sup 2/, which is favourably with Cu vias. This is the first trial demonstration of CNT vias for future LSI interconnects.

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