Abstract
In this paper, we report titanium carbide formation on a titanium metal substrate by using a 3.3 kJ Mather-type dense plasma focus (DPF) device equipped with a graphite carbon source. The titanium substrate is inserted from the top of the plasma chamber and is irradiated by argon and carbon ions produced in multiple shots of DPF. X-ray diffraction spectra of the layer formed on the titanium substrate with 10, 15, 20, 25 and 30 shots at a typical distance of 2.5 cm from the top of the anode show peaks corresponding mostly to titanium carbide. The surface morphology and hardness of the layer formed have been investigated using a scanning electron microscope and a Knoop microhardness tester, respectively.
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