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Abstract
Abstract The effect of argon and oxygen sputtering on carbon contaminant buildup on ZnO during XPS (X-ray photoelectron spectroscopy) analysis has been examined. Argon and oxygen sputtering cause a rapid decline in hydroxyl oxygen and contaminant carbon content at the surface. Reduction to metallic zinc is not observed. In a carefully baked instrument after sputtering a stable clean surface could be maintained over several hours of analysis.
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