Abstract
ABSTRACT Hydrogenated carbon-based films, such as DLC (“Diamond Like Carbon”), have interesting properties such as excellent tribological behavior, low friction coefficient, high superficial hardness and good wear resistance; they are chemically inert and highly corrosion resistant. They are deposited by means of PACVD (plasma-assisted chemical vapor deposition) with variable film thickness. The load carrying capacity grows with the thickness, so it is possible to deposit thick films on “soft” steels (e.g. low alloyed steels). When increasing coating thickness, surface defects are generated during the deposition process compromising their excellent properties. In this work, different metal substrates have been used to compare adhesion and quantify superficial defects: AISI 316L, DIN 42CrMo4 (AISI 4140) and Bohler K110 (AISI D2). The films were deposited at different temperatures, changing the silicon content and the coating thickness. The samples were placed in the furnace on different positions (standing, lying or up-side down). The films were analyzed with optical and electron microscopy, 3D topography profilometer, and they were tested under sliding wear conditions. Friction coefficient and wear volume were measured, with an average friction coefficient which resulted below 0.05. A higher amount of surface defects was obtained on lying samples compared to the ones up-side down. The quantity of defects increased with the thickness of the coating and decreased with the temperature. The geometry and the growth mechanism of the defects were analyzed.
Highlights
Hydrogenated amorphous carbon films (a-C:H) are a composed of carbon and hydrogen, with different C-C and C-H bondings, sp2 and sp3
The incorporation of silicon as coating dopant and an amorphous silicon interlayer helps to solve this problem, allowing to increase the load bearing capacity of the system; this coating is known as a-C:H:Si
Samples were coated with a-C:H:Si using the PACVD technique (Plasma Assisted Chemical Vapor Deposition), in a commercially available ion nitriding plant, provided by the company Rübig, with a DC pulsed discharge that generates and sustains the plasma
Summary
Hydrogenated amorphous carbon films (a-C:H) are a composed of carbon and hydrogen, with different C-C and C-H bondings, sp (graphite) and sp (diamond). The result is a hard coating, with extremely low friction coefficient and good wear resistance. These films are chemically inert in most aggressive environments and provide a good corrosion resistance making them attractive for many technological applications: mechanicals, electronical, biomed, and petrochemical and food industry [1,2,3,4]. As a drawback, these films have high internal stresses that result in low adhesion. A higher amount of hydrogen and a drop of sp carbon bonds lead to a decrease in the film stress and helps prevent delamination [4,5,6]
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