Capability Resurrection of DC Sputtering Machine

Abstract

Nanocoatings are gaining popularity owing to their widespread applications and the physical vapour deposition constitutes an effective method of deposition of coatings onto a suitable substrate. This work comprises of capability resurrection of a newly installed DC sputtering machine through troubleshooting, calibration, and establishment of process parameter mainly in terms of critical-to-performance (CTP) characteristic identified as the sputtering voltage. This work exercises the identification of potential causes for the breakdown of the sputtering machine through Ishikawa diagram and root cause is identified through the why-why analysis. Prioritization of corrective actions through process failure modes and effects analysis (PFMEA). Correct functioning of the DC sputtering machine after taking corrective action, is validated and confirmed through experimentation. This work shall serve as a reference to the maintenance and process personnel and guide them to perform the experiments related to DC sputtering in a laboratory environment.