Cancer cells (MCF-7, Colo-357, and LNCaP) viability on amorphous hydrogenated carbon nitride film deposited by dielectric barrier discharge plasma

Abstract

Atmospheric pressure dielectric barrier discharge plasma in CH4/N2 (1:1) gas mixture has been employed to deposit amorphous hydrogenated carbon nitride (aH–CNx) film. In vitro studies with three different cancer cell lines were carried out on the coated surfaces. Preliminary biocompatibility and effect of CH4/N2 films have been investigated by measuring cell proliferation. Three different cancer cell (MCF-7, Colo-357, and LNCaP) suspensions have been exposed on the surface of aH–CNx film to investigate the effect of deposited films on viability of cells. Results from the MTS (3-(4,5-dimethylthiazol-2-yl)-5-(3-carboxymethoxyphenyl)-2-(4-sulfophenyl)-2H- tetrazolium, inner salt) proliferation assays indicated that the deposited aH–CNx film is cytotoxic to cancer cell lines. Time course cell viability assay indicated maximum cell death at 24 h after seeding the cells. This effect is dependant on physicochemical and mechanical properties of the deposited films. The deposited film has been characterized by x-ray photoelectron spectroscopy and Fourier transform infrared spectroscopy. The results confirm the presence of C–N, C≡N, C–Hx, C–O, N–O, overlapping NH, and OH bonds in the film.