Calibration of Waveplate Retardance Fluctuation Due to Field-of-View Effect in Mueller Matrix Ellipsometer

Abstract

Leveraging their unique phase modulation characteristics, birefringent waveplates have been widely used in various optical systems. With the development of material science and manufacturing techniques, the polarization properties of waveplates have become increasingly complex and diverse. Among these properties, the field-of-view effect of the waveplate caused due to manufacturing defects or improper installation procedures is extremely difficult to calibrate and seriously affects the precision and accuracy of the relevant optical systems. In this paper, a calibration method that can compensate for the field-of-view effect of waveplates installed in the instrument is proposed. Moreover, to approve the fidelity of the proposed calibration method, a series of film thickness measurement experiments are carried out. The results show that under different installation conditions of the waveplates, the precision and accuracy of the film thickness measured with the proposed method significantly improved. This method can be expected to reduce the assembly difficulty of such optical systems, while also improving their accuracy and stability.