Abstract
The results of work on the stabilization of the wall thickness of quartz tubes by means of external vapor-phase deposition during high-temperature hydrolysis of silicon tetrachloride are presented. The technological parameters of deposition and sintering of a porous layer are determined. Defect-free layers of glass of thickness greater than 0.2 mm with the possibility of lowering the circumferential thickness variation of the tubes from 0.2 to 0.05 mm are obtained.
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