Abstract
When considering the thermal processes of multilayer nanostructures, a significant part of the energy is dissipated at the boundaries of the layers; to take this factor into account, the Kapitza resistance is used in the simulation. In this study, we calculate the thermal resistance at the Si/SiO2 interface (alpha-quartz) structures for the temperature range up to 567 K. The calculations are carried out based on the acoustic and diffuse mismatch models. The results obtained, in particular, can be used in constructing models of heat transfer in microelectronics.
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Schedule a callMore From: Izvestiya Vysshikh Uchebnykh Zavedenii. Materialy Elektronnoi Tekhniki = Materials of Electronics Engineering
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