Abstract
A pulsed glow discharge is used for sputtering in the presence of a gas flow to form a metal vapour jet suitable for use in a room-temperature metal vapour laser. It is found that the sputtering process is most efficient during the first 50 mu s of the discharge pulse. Switching the discharge in the burst mode with a pulse duration of about 15 mu s and an interpulse delay of about 18 mu s achieves similar metal vapour concentrations in the jet to that attained by steady-pulse sputtering, but requires only half the total discharge energy.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
