Abstract

Silicon growth from Si–Fe melts was investigated in view of producing high-quality Si using induced temperature gradients. Scanning electron microscopy coupled with energy-dispersive spectroscopy and micro-computed tomography analyses were used to characterize the quality of bulk Si, in particular its microstructure and purity. The migration of Si and Fe atoms along a temperature gradient in the mushy zone of the Si–Fe alloy was evidenced, which became the source of Si precipitation on the C substrate, and ultimately forming bulk Si. Furthermore, the content of residual Fe–Si can be decreased in the bulk Si by controlling the temperature gradient, the holding time, and the alloy composition.

Full Text
Paper version not known

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call

Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.