Abstract

In this study, we used strippable LR 115 type 2 which is a Solid State Nuclear Track Detector (SSNTD) widely known for radon gas detection and measurement. The removed thickness of the active layer of samples of this SSNTD, were determined by measuring the average initial thickness (before etching) and residual thickness after 80 to 135 minutes chemical etching in the standard conditions, using an electronic comparator. These results allowed the calculation of the bulk etch rate of this detector in a simple way. The mean value obtained is (3.21 ± 0.21) μm/h. This value is in close agreement with those reported by different authors. It is an important parameter for alpha track counting on the sensitive surface of this polymeric detector after chemical etching because track density depends extremely on its removed layer. This SSNTD was then used for environmental radon gas monitoring in Côte d’Ivoire.

Highlights

  • Radon, a natural radioactive and lung carcinogen gas [1] can be detected by many techniques [2] [3] [4]

  • The removed thickness of the active layer of samples of this Solid State Nuclear Track Detector (SSNTD), were determined by measuring the average initial thickness and residual thickness after 80 to 135 minutes chemical etching in the standard conditions, using an electronic comparator

  • The mean value obtained is (3.21 ± 0.21) μm/h. This value is in close agreement with those reported by different authors. It is an important parameter for alpha track counting on the sensitive surface of this polymeric detector after chemical etching because track density depends extremely on its removed layer

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Summary

Introduction

A natural radioactive and lung carcinogen gas [1] can be detected by many techniques [2] [3] [4]. Many authors had established that the removed active layer of Solid State Nuclear Track Detector during etching is one of the main factors influencing the track parameters or shape characteristics [11] [12] [13]. The bulk etch rate is strongly related to the removed thickness of the active layer and it has been shown that Vb depends on many factors like the purity of the basic substances, the molecular structures of polymers, conditions of polymerization, environmental conditions during the irradiation and on etching conditions [17]. Our main concern in this study is to determine in the standard etching conditions, the bulk etch rate of LR 115 type 2 by measuring the thickness of its active layer before and after chemical etching using an electronic comparator

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