Abstract
Crystalline BaB6 (100) thin films can be fabricated on MgO (100) substrates by inserting a 2–3nm-thick epitaxial SrB6 (100) buffer layer by pulsed laser deposition (PLD) in ultra-high vacuum (i.e., laser molecular beam epitaxy). Reflection high-energy electron diffraction and X-ray diffraction measurements indicated the heteroepitaxial structure of BaB6 (100)/SrB6 (100)/MgO (100) with the single domain of the epitaxial relationship. Conversely, BaB6 thin films without the buffer layer were not epitaxial instead they developed as polycrystalline films with a random in-plane configuration and some impurity phases. As a result, the buffer layer is considered to greatly affect the initial growth of epitaxial BaB6 thin films; therefore, in this study, buffering effects have been discussed. From the conventional four-probe measurement, it was observed that BaB6 epitaxial thin films exhibit n-type semiconducting behavior with a resistivity of 2.90×10−1Ωcm at room temperature.
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