Abstract
In this paper, we discuss the use of broadband microwaves (MW) (up to 20 GHz) to characterize the thermal stability of dielectric thin films for emerging nanoelectronic applications. We will illustrate the talk with examples from our on-going work on the thermal stability of organic and hybrid silicon-organic thin films meant for insulation applications in micro- and nanoelectronic devices. We will illustrate our use of MW propagation characteristics to extract changes in electrical and mechanical properties and their links to the changes in chemistry of prototypical materials. These studies shine light on the chemical changes that occur within the dielectric films that could impact the performance and reliability, as well as provide basis for rational selection of organic dielectrics for integrated devices.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
