Abstract

A single-beam interference-lithography scheme is demonstrated for the fabrication of large-area slant gratings, which requires exposure of the photoresist thin film spin-coated on a glass plate with polished side-walls to a single laser beam in the ultraviolet and requires small coherence length of the laser. No additional beam splitting scheme and no adjustments for laser-beam overlapping and for optical path-length balancing are needed. Bragg-angle diffractions are observed as strong optical extinction that is tunable with changing the angle of incidence. This device is important for the design of efficient filters, beam splitters, and photonic devices.

Highlights

  • Interference lithography [1,2] is a conventional technique for producing large-area one- and two-dimensional grating structures in the micro- or nano-scale

  • A single-beam interference-lithography scheme is demonstrated for the fabrication of large-area slant gratings, which requires exposure of the photoresist thin film spin-coated on a glass plate with polished side-walls to a single laser beam in the ultraviolet and requires small coherence length of the laser

  • We demonstrate a simple interference lithography scheme using a single laser beam in the ultraviolet to fabricate slant gratings, where the slant interference pattern forms in the photoresist between the directly transmitted part of the incident laser beam through the substrate and the other part that is refracted into the substrate through the side wall

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Summary

Introduction

Interference lithography [1,2] is a conventional technique for producing large-area one- and two-dimensional grating structures in the micro- or nano-scale. This technique can be used to fabricate the master gratings for the construction of metallic photonic crystals [3], which are important for the development of new lasers,[4] polarizers [5], filters [6], and other photonic devices [7,8]. High flexibility in the interference-lithography scheme using different arrangements of the laser beams enables realization of a variety of photonic structures [9,10,11]. Portant for practical applications in high-contrast filters, beam splitters, and in the design of photonic crystal devices

Fabrication of the Slant Gratings
Bragg-Angle Diffractions in Slant Gratings
Findings
Conclusion
Full Text
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