Abstract
Results on an optical waveguide filter operating in the near IR region are reported. The device consists of a hybrid sol‐gel ‐based grating loaded waveguide, obtained through the merging of conventional photolithography and UV‐nanoimprinting. Starting from submicrometric gratings, fabricated by electron beam lithography, a soft mould has been produced and the original structures were replicated onto sol‐gel photosensitive films. A final photolithographic step allowed the production of grating‐loaded channel waveguides. The devices were optically characterized by transmission measurements in the telecom range 1450–1590 nm. The filter extinction ratio is −11 dB and the bandwidth is 1.7 nm.
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