Abstract
AbstractProton beam writing, being a direct write lithographic technique, is well suited to rapid prototyping of micro- and nanophotonic devices [1]. The technique can be applied to a wide range of materials, including polymers [2], semiconductors [3], and glasses [4, 5]. Furthermore, the minimum feature size that can be routinely obtained is well matched to current photonic device technology (100 nm–1 μ m resolution). We will now discuss in more detail how proton beam writing can be used to fabricate some common optical components that can be used to make more complicated photonic devices.KeywordsProton BeamRefractive Index ContrastMinimum Feature SizeSurface Relief GratingNanophotonic DeviceThese keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.
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