Abstract
In this paper, a novel boron nitride hollow microtube (BNHM) structure by annealing assisted high-pressure etching method. The products were characterized by XRD, FTIR, Raman, XPS, SEM, TEM, TGA, BET, UV–vis, and PL. The result shows that the sample displayed a one-dimensional hollow tube structure directionally covered with nanosheets. The average inner diameter of the hollow tube is 1 µm with a length of 2–4.5 µm. And the wall thickness of the hollow tube structure is about 100 nm. In addition, the band gap value of the sample is 5.51 eV presenting the strongest absorption peak at 225 nm. The specific surface area of the sample is 272.6 m2·g−1, showing good adsorption efficiency on Congo red (absorbed 75% in 5 min). Meanwhile, the possible growth mechanism of BNHM is also discussed.
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