Abstract
Many nanofabrication methods based on scanning probe microscopy have been developed during the last decades. Local anodic oxidation (LAO) is one of such methods: Upon application of an electric field between tip and surface under ambient conditions, oxide patterning with nanometer-scale resolution can be performed with good control of dimensions and placement. LAO through the non-contact mode of atomic force microscopy (AFM) has proven to yield a better resolution and tip preservation than the contact mode and it can be effectively performed in the dynamic mode of AFM. The tip plays a crucial role for the LAO-AFM, because it regulates the minimum feature size and the electric field. For instance, the feasibility of carbon nanotube (CNT)-functionalized tips showed great promise for LAO-AFM, yet, the fabrication of CNT tips presents difficulties. Here, we explore the use of a carbon nanofiber (CNF) as the tip apex of AFM probes for the application of LAO on silicon substrates in the AFM amplitude modulation dynamic mode of operation. We show the good performance of CNF-AFM probes in terms of resolution and reproducibility, as well as demonstration that the CNF apex provides enhanced conditions in terms of field-induced, chemical process efficiency.
Highlights
Scanning probe lithography (SPL) is increasing its relevance among currently employed methods towards miniaturization and investigations at the nanometer scale
We explore the use of a carbon nanofiber (CNF) as the tip apex of atomic force microscope (AFM) probes for the application of local anodic oxidation (LAO)-AFM on silicon substrates in amplitude modulation dynamic mode of operation
CNF-AFM probes have been tested for the first time as a tool for nanopatterning based on LAO-AFM in the amplitude modulation dynamic mode
Summary
Scanning probe lithography (SPL) is increasing its relevance among currently employed methods towards miniaturization and investigations at the nanometer scale. Interest of developing SPL-based nanofabrication methods relies on its extraordinary performance in terms of resolution and flexibility, as well as its potential for applications, e.g., in materials/surface science, quantum devices and nanoelectronics [1]. SPL can be performed in a wide variety of instrument configurations and operation modes, such as in scanning tunneling microscopy (STM) or atomic force microscope (AFM). Based on the latter, AFM, it excels in versatility, as its working principle allows AFM to be applied conveniently onto any surface and in a variety of atmospheres [2,3,4]. The application of an electric field between a conductive tip and a silicon substrate under ambient conditions can generate the local anodic oxidation (LAO) of the silicon surface very precisely; intrinsic silicon oxide (SiOx) patterns are in the single/double-digit nanometer-range [8]
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