Abstract
Carbon nitride (CNx) bilayer films with Ti and TiN interlayer were synthesized by cathode arc technique at various nitrogen pressures (PN2). The dependences of microstructure and bonding composition of the films on the PN2 and interlayer were analyzed by Raman spectroscopy and X‐ray photoelectron spectroscopy. Microstructure evolution consisting of the ordering and size of Csp2 clusters, the faction of N–sp3/N–sp2 bonds and graphite‐like/pyridine‐like configurations was dominated by PN2, interlayer and annealing. The results showed that Ti and TiN interlayer decrease the atomic ratio of N/C and increase clustering Csp2. High PN2 induces the formation of C ≡ N and C − N bonds, the increase of sp2‐bonding content and the growth of Csp2 clusters. A large part of nitrogen atoms are coordinated with sp2‐hybridized carbon (minimum 71% for annealed CNx monolayer). TiN/CNx bilayer had a higher content of pyridine‐like configuration. Morphological characteristics of CNx monolayer and bilayer mainly depend on the surface character (roughness and surface energy) of the sublayer. The internal stress in the as‐deposited Ti/CNx bilayer is smaller, but it after annealing is higher than that of CNx monolayer and TiN/CNx bilayer. These results may be of interest for studying the CNx films with controlled bonding composition and expected engineering properties. Copyright © 2014 John Wiley & Sons, Ltd.
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