Abstract
SiC/BN/SiC 1D minicomposites were produced by infiltration of a Hi-Nicalon (from Nippon Carbon, Japan) fiber tow in a Low Pressure Chemical Vapor Deposition reactor. Tris(dimethylamino)borane was used as a halogenide-free precursor for the BN interphase processing. This precursor prevents fiber and CVD apparatus from chemical damage. FT-IR and XPS analyses have confirmed the boron nitride nature of the films. Minicomposite tensile tests with unload-reload cycles have shown that the minicomposite mechanical properties are good with a high interfacial shear stress. Transmission electron microscopy observation of the interphase reveals that it is made of an anisotropic turbostratic material. Furthermore, the fiber/matrix debonding, which occurs during mechanical loading, is located within the BN interphase itself.
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