Block co-polymer guided self-assembly by surface chemical modification: optimization of multiple patterning process and pattern transfer

Abstract

Block co-polymer (BCP) lithography is becoming an established technique for patterning beyond optical lithography limitations. It is based on combining the intrinsic property of the block co-polymers to phase separate at the molecular scale with the capabilities of conventional top-down lithographic methods for patterning surfaces. Guiding the selfassembly of block co-polymers by surface chemical modification is one of the most used processes to drive the selfassembly in a convenient way. It consists on using lithography and oxygen plasma to create different wettability regions on a polymer brush grafted on the surface. For creating patterns with sub-22 nm resolution, this process introduces a tight restriction in the guiding lithography process. We present an easier guided self-assembly process by surface chemical modification that allows for a more relaxed guiding pattern specifications, providing a simpler route for the fabrication of nanometer scale structures.