Abstract
Abstract Blisters have been observed in evaporated alumina thin films after xenon irradiation. The aim of this study is to further understand the mechanisms responsible of such process. Surface blistering dependence on thickness of the alumina films as well as irradiation fluence, temperature and post-irradiation thermal annealing have been investigated. From our experimental results, it has been proved that the substrate-alumina interface is not responsible for blistering. Also, according to the gas pressure model and the lateral compressive stress model the latter seems to be more adequate to explain blister formation.
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