Abstract
Recent advances in LSI and VLSI have offered many possibilities in mixing MOSFET and bipolar integrated structures on the same chip. The authors study the integration of bi-polar structures in BIMOS environments. More specifically bipolar structures are studied under the constraints and guidelines of a given MOS technology, e.g., the nonexistence of an n/SUP +/ underlayer, and the high epitaxial (substrate) resistivity. A bipolar structure, based on merging a multicollector p-n-p transistor with a multiemitter n-p-n transistor is proposed. The structure takes advantage of the availability of clock signals on a MOS chip, and uses the epitaxial (substrate) resistance as a load. It can be used to realize logic and memory functions. Computer simulation as well as experimental results show that the structure can perform efficiently in both BIMOS and bipolar technologies.
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