Abstract
Sub-wavelength antireflection moth-eye structures were fabricated with Nickel mold using Roll-to-Plate (R2P) ultraviolet nanoimprint lithography (UV-NIL) on transparent polycarbonate (PC) substrates. Samples with well replicated patterns established an average reflection of 1.21% in the visible light range, 380 to 760 nm, at normal incidence. An excellent antireflection property of a wide range of incidence angles was shown with the average reflection below 4% at 50°. Compared with the unpatterned ultraviolet-curable resin coating, the resulting sub-wavelength moth-eye structure also exhibited increased hydrophobicity in addition to antireflection. This R2P method is especially suitable for large-area product preparation and the biomimetic moth-eye structure with multiple performances can be applied to optical devices such as display screens, solar cells, or light emitting diodes.
Highlights
Until now, multilayer coating[12] and graded index coating[13,14] were the two most commonly used approaches to fabricate an efficient AR coating
Thermal and UV imprinting are involved in the nanoimprint lithography (NIL) technique, and both can be applied directly to polymer surfaces
NIL technique had been intensively used in the fabrication of AR products
Summary
SEM image of PDMS flexible female mold. Figure 2a shows a typical SEM image of the PDMS flexible female mold fabricated by the replication of the Ni mold. All these samples mentioned above were less reflective than flat UV-curable resin coated PC substrate, which was 6.22% in average based on the data of curve (f)
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