Abstract
We present our recent results, related to nanoscale imaging in the extreme ultraviolet (EUV) and soft X-ray (SXR) spectral ranges and demonstrate three novel imaging systems recently developed for the purpose of obtaining high spatial resolution images of nanoscale objects with the EUV and SXR radiations. All the systems are based on laser-plasma EUV and SXR sources, employing a double stream gas puff target. The EUV and SXR full field microscopes—operating at 13.8 nm and 2.88 nm wavelengths, respectively—are currently capable of imaging nanostructures with a sub-50 nm spatial resolution with relatively short (seconds) exposure times. The third system is a SXR contact microscope, operating in the “water-window” spectral range (2.3–4.4 nm wavelength), to produce an imprint of the internal structure of the investigated object in a thin surface layer of SXR light sensitive poly(methyl methacrylate) photoresist. The development of such compact imaging systems is essential to the new research related to biological science, material science, and nanotechnology applications in the near future. Applications of all the microscopes for studies of biological samples including carcinoma cells, diatoms, and neurons are presented. Details about the sources, the microscopes, as well as the imaging results for various objects will be shown and discussed.
Highlights
Introduction and Previous AchievementsAdvancements in nanoscience and nanotechnology require tools and methods for nanometer scale resolution imaging
Since there is no ideal solution for the source at the moment, it is necessary to find a good compromise in desktop soft X-ray (SXR)/extreme ultraviolet (EUV) imaging systems, between the performance—namely, high photon flux; possibility to obtain high spatial resolution images with low exposure time; and the complexity, size, cost of these setups, which is still the main limitation of short wavelength photon-based microscopes disallowing their wide-spread
All microscopes are based on laser plasma sources producing the EUV and SXR radiations through interaction of nanosecond laser pulses with double stream gas puff target
Summary
Advancements in nanoscience and nanotechnology require tools and methods for nanometer scale resolution imaging. Since there is no ideal solution for the source at the moment, it is necessary to find a good compromise in desktop SXR/EUV imaging systems, between the performance—namely, high photon flux; possibility to obtain high spatial resolution images with low exposure time; and the complexity, size, cost of these setups, which is still the main limitation of short wavelength photon-based microscopes disallowing their wide-spread. Some of these problems can be addressed employing double stream gas puff target laser plasma sources for microscopy purposes. The goal of developing these microscopes is to show feasibility to achieve high resolution imaging, low exposure times, together with a compact footprint, which may in the future open a possibility for commercialization
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