Binary Mixtures of SH- and CH3-Terminated Self-Assembled Monolayers to Control the Average Spacing Between Aligned Gold Nanoparticles

Asad Rezaee,Laura C Pavelka,Silvia Mittler

doi:10.1007/s11671-009-9399-2

Asad Rezaee, Laura C Pavelka + Show 1 more

Open Access

https://doi.org/10.1007/s11671-009-9399-2

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Journal: Nanoscale Research Letters	Publication Date: Aug 2, 2009
Citations: 9	License type: CC BY 2.0

Affiliation: Western University

Abstract

This paper presents a method to control the average spacing between organometallic chemical vapor deposition (OMCVD) grown gold nanoparticles (Au NPs) in a line. Focused ion beam patterned CH3-terminated self-assembled monolayers are refilled systematically with different mixtures of SH- and CH3-terminated silanes. The average spacing between OMCVD Au NPs is demonstrated systematically to decrease by increasing the v/v% ratio of the thiols in the binary silane mixtures with SH- and CH3-terminated groups.

Highlights

Along with the other applications, recent years have seen a tremendous impact on gold nanoparticle (Au NP) optical response in biological assays, detection, labeling, and sensing [1]
We have recently introduced a new method to align organometallic chemical vapor deposited (OMCVD)-grown Au NPs via focused ion beam (FIB) nano-lithography on a selfassembled monolayer (SAM) functionalized substrates and refilling the structures with a pure SH-terminated silane SAM [6]
We found that 94 °C is the optimum temperature, at which MPTS can still have a covalent bonding onto the oxide surface and the –SH head groups are still intact, whereby Au NPs bond onto the thiols. 120 °C was tried for MPTS, but most of the time, Au NPs did not bind to the SAMs anymore

Summary

Introduction

Along with the other applications, recent years have seen a tremendous impact on gold nanoparticle (Au NP) optical response in biological assays, detection, labeling, and sensing [1]. It was concluded that the average spacing between Au NPs can be controlled by varying the FIB dose. OTS plays two roles: a resist SAM to be patterned by FIB and a dilution in the binary mixture solutions of MPTS and OTS to refill the Nanoscale Res Lett (2009) 4:1319–1323 patterned lines to control the density of functional SHgroups for Au NP nucleation.

Results

Conclusion