Abstract

Recent studies show that the optimized dithering techniques can improve 3D shape measurement quality with a defocused projector in the digital fringe projection system. The previous techniques optimize the binary fringe quality in intensity or phase domain according to their objective functions. Intensity based optimization has better robustness to the projector defocus levels, but it cannot fully improve the fringes phase quality. Phase based optimization is efficient, but sensitive to projector defocus levels. This paper proposes a technique to combine the phase based optimization and intensity based optimization. The technique is implemented on the whole fringe optimization, to generate high-quality binary fringe patterns. Simulations and experiments show that the proposed combined optimization technique can produce high phase quality binary fringe patterns with robustness to projector defocus levels.

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