Abstract
A method of transferring a bilayer of polymer capped with metal to a substrate isdeveloped with a mould that is coated with a metal followed by a polymer. Aself-assembled monolayer chemisorbed on the mould surface plays a key role in the bilayertransfer. This bilayer reversal imprint lithography offers a distinct advantageover other imprint techniques in allowing for a high aspect ratio of the patterntransferred onto a substrate, which has been difficult to obtain for small feature sizes.The method requires only one etching step as opposed to the two etching stepstypically needed in the imprint lithography, which can degrade the pattern fidelity.
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