Abstract
The residual stresses, surface roughness and microstructure in titanium oxide films prepared by electron-beam evaporation and deposited with different geometries were investigated, with particular focus on the in-plane anisotropy of the biaxial stresses and microstructures. Thin films were deposited with various deposition angles on B270 glass substrates and silicon wafers. Two different types of deposition geometries were studied. The residual stress in the thin films was examined by a phase-shifting Twyman-Green interferometer. The optical constants, biaxial stress and surface roughness were found to be related to the evolution of the anisotropic microstructures in the films. The results revealed that the anisotropic stresses that developed in the evaporated titanium oxide films were dependent upon the deposition geometry and microstructure of the films.
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