Beyond diffraction limit in optical lithography via quantum entanglement

Abstract

The ever-increasing power of computers entirely rely on the fine technique of lithography which writes the circuit images onto semiconductor chips. The resolution in optical lithography is limited by so-called Rayleigh diffraction limit of of λ/2, where λ is the optical wavelength. Hence the conventional way to achieve better resolution is to use shorter wavelength light. But the imaging technique, however, easily becomes problematic for UV or X-ray region. By using entangled photon pairs we may overcome such difficulties.