Abstract
Industrial wafer scanners often consists of multiple subsystems. Traditionally, these systems-of-systems are divided into manageable subproblems at the expense of the overall performance, that is determined by the synchronicity of the motions of the subsystems. The aim of this paper is to enhance overall system performance by posterior coupling of the controlled subsystems. A framework that relates to the Youla parameterization is developed that connects the additional control elements affinely to the overall system performance criterion. The resulting framework parametrizes all stabilizing bidirectional coupling controllers, and enables improved performance. Robust stability is subsequentially addressed through a double-Youla approach. Application to a wafer scanner confirms superior performance of the joint wafer stage and reticle stage performance, while maintaining full system robust stability.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
