Abstract
A negative tone, aqueous base developable molecular glass resist, 3Ep, is presented that is developable in both standard organic solvents and aqueous base developers. The resist shows slightly better imaging performance in organic solvent versus aqueous base and shows a shift of E0 away from zero dose. Compared to a previously reported 4Ep resist, 3Ep appears to have a more controlled polymerization rate at equivalent conditions, which results in higher-quality patterned features. 3Ep also requires use of an underlayer to avoid de-wetting during aqueous base development.
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