Abstract
The study of barrier and semiconducting properties of anodically formed oxide films on chromium in an acid solution was carried out using the Cr-quartz crystal electrode. The oxide film formation and growth occur through an anion vacancies transport via a low-field-assisted mechanism (H = 106 V cm−1). The anion diffusion coefficient, which quantitatively describes the transport of point defects within the growing film, was calculated from capacitance data using the Nernst-Planck equation for low-field limit approximation and Mott-Schottky analysis. The depletion region in the passive film, close to the film|electrolyte interface, dominates the semiconducting properties. The passive film on Cr in an acid solution behaves as an n-type semiconductor. An energy-band structure model of the passive film is given.
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