Abstract

This paper explores band structure effect on the quantum transport of a low-dimensional GaSb Schottky MOSFET (SBFET) for the implementation of III---V transistor with a low series resistance. Precise treatment of the full band structure is employed applying sp 3 d 5 s ∗ tight-binding (TB) formalism. A remarkable distinction between the thickness dependent effective masses extracted from the TB and the bulk values imply that the quantum confinement modifies the device performance. Strong transverse confinement leads to the effective Schottky barrier height increment. Owing to the adequate enhanced Schottky barriers at low drain voltages, a double barrier gate modulated potential well is formed along the channel. The double barrier profile creates a longitudinal quantum confinement and induces drain current oscillation at low temperatures. Significant factors that may affect the current oscillation are thoroughly investigated. Current oscillation is gradually smoothed out as the gate length shrinks down in ultra scaled structure. The results in this paper are paving a way to clarify the feasibility of this device in nanoscale regime.

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