Abstract

It is demonstrated that treating dielectrics with fluorinated polymers, which have excellent hydrophobicity, chemical inertness, and the lowest polarizability, yields a semiconductor‐compatible surface energy and excellent charge detrapping characteristics. Fluorocopolymers, polystyrene‐random‐poly(2,3,4,5,6‐pentafluorostyrene) (PS‐r‐PPFS) copolymers with different 2,3,4,5,6‐pentafluorostyrene (PFS) loadings, are synthesized to modify a SiO2 gate dielectric using radical polymerization. Surface energy (γ) of the copolymer‐treated SiO2 dielectrics decreases from 40.7 to 24.0 mJ m−2 with increasing PFS mol% in the copolymer. Pentacene organic field‐effect transistors (OFETs) show field‐effect mobility (μFET) values ranging from 0.82 (for 0 mol% PFS) to 0.25 cm2 V−1 s−1 (for 100 mol% PFS). Enhancing the bias stress stability without affecting the μFET value is achieved via the introduction of a small mol% fluorocarbon segments onto the PS‐r‐PPFS backbone. 15 mol% PFS‐loaded fluorocopolymer‐coated SiO2 substrate yields a γ value of 35 mJ m−2, close to that (38 mJ m−2) of the lowest‐γ crystal surface of pentacene, and the corresponding OFETs have μFET values up to 0.81 cm2 V−1 s−1 and excellent gate‐bias stress stability in comparison to the rich fluorinated dielectric systems, which has degraded μFET values ranging from 0.2 to 0.4 cm2 V−1 s−1.

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