Abstract
A conventional large-area indirect-conversion X-ray detector usually adopts front side illumination (FSI) of a scintillator atop a photodiode-integrated thin-film transistor (TFT) array. This work however proposes a backside illuminated (BSI) three-dimensional dual-gate photosensitive a-Si:H TFT (3-D DGTFT) on a scintillating glass substrate, aiming for indirect-conversion X-ray detection. It not only improves the sensitivity with a 3-D photosensitive TFT as an active pixel sensor, but also enhances the resolution and photon utilization by reducing photon scattering and optical crosstalk. Backside illumination of 3-D photosensitive TFT-integrated scintillating glass therefore provides an alternative approach to large-area indirect-conversion X-ray imaging.
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