Abstract
As we have demonstrated, the AGIF procedure allows designers to create accurate and efficient full-wave EM structures directly from IC layouts in semiconductor processes. The template based procedure also allows batch conversion and EM-simulation of structures directly from GDS II. It makes it possible to apply full-wave EM simulation to large number of structures in industrial design environment. The precision and reliability of the CMOS manufacturing, the accuracy of full-wave EM tools, and the effectiveness of automatic conversion in AGIF are verified.
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